Photosensitive Resist Film
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Product Name:
Photosensitive Resist Film
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Chemical Name (IUPAC):
Poly(1,2-dihydro-2-oxo-3H-naphthalen-3-yl methacrylate-co-methyl methacrylate)
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CAS No.:
9003-07-0
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Chemical Formula:
C22H20O5
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Form/Physical State:
Solid
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Factroy Site:
West Ujimqin Banner, Xilingol League, Inner Mongolia, China
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Price Inquiry:
sales9@bouling-chem.com
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Manufacturer:
Bouling Coating
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CONTACT NOW
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Photosensitive Resist Film is typically used in formulations when pattern resolution and adhesion properties and thermal stability and exposure dose must be controlled within specific ranges.
Specifications
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HS Code
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755102
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| Type |
Photosensitive Resist Film |
| Application |
PCB fabrication |
| Base Material |
Polyethylene Terephthalate (PET) |
| Color |
Blue |
| Thickness |
30 microns |
| Adhesive Type |
Acrylic |
| Light Sensitivity |
UV |
| Development Method |
Alkaline aqueous solution |
| Resolution |
10 microns |
| Shelf Life |
12 months |
| Storage Temperature |
10-25°C |
| Peel Strength |
1.2 N/cm |
| Exposure Energy |
50 mJ/cm² |
| Hardness |
2H pencil |
| Elongation |
100% |
As an accredited Photosensitive Resist Film factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.
Packing & Storage
| Packing |
The packaging consists of a sealed, light-proof box containing 10 sheets of photosensitive resist film, each measuring 20x30 cm. |
| Container Loading (20′ FCL) |
Container Loading (20′ FCL): Photosensitive Resist Film securely packed on pallets, moisture-proof wrapping, maximizing 20-foot container space for safe, stable transport. |
| Shipping |
The photosensitive resist film is securely packaged in moisture-proof, light-blocking materials to prevent exposure and degradation during transit. It is shipped in temperature-controlled conditions where required. Packages are clearly labeled as sensitive material, and all handling instructions are included to ensure product integrity until arrival at the customer’s site. |
| Storage |
Photosensitive Resist Film should be stored in a cool, dry, and dark environment, ideally between 5–25°C (41–77°F) with humidity below 60%. Avoid exposure to direct sunlight, UV light, and strong artificial lights to prevent premature polymerization. Keep the film in its original, tightly sealed packaging until use. Store away from acids, bases, solvents, and sources of heat or ignition. |
| Shelf Life |
Photosensitive Resist Film typically has a shelf life of 6-12 months when stored unopened in cool, dry, and dark conditions. |
Application of Photosensitive Resist Film
Thickness uniformity: Photosensitive Resist Film with thickness uniformity is used in photolithography for semiconductor wafer processing, where it ensures precise pattern transfer and consistent feature dimensions.Resolution capability: Photosensitive Resist Film with high resolution capability is used in the fabrication of printed circuit boards, where it enables the creation of fine circuit patterns and high-density interconnects.Solvent resistance: Photosensitive Resist Film with enhanced solvent resistance is used in microelectromechanical systems (MEMS) manufacturing, where it maintains structural integrity during aggressive developer and etch processes.Developer compatibility: Photosensitive Resist Film formulated for aqueous developer compatibility is used in LCD panel production, where it allows efficient developing with reduced environmental impact.Adhesion strength: Photosensitive Resist Film with high adhesion strength is used in advanced packaging applications, where it prevents delamination during multi-step exposure and etching cycles.Sensitivity wavelength: Photosensitive Resist Film optimized for 365 nm sensitivity wavelength is used in UV lithography, where it achieves sharp imaging and high throughput during mask alignment.Thermal stability: Photosensitive Resist Film with thermal stability up to 200°C is used in multi-layer microfabrication, where it withstands post-exposure baking without distortion or degradation.Particle size: Photosensitive Resist Film with submicron particle size is used in microscale device fabrication, where it provides smooth coating and sharp pattern edges for critical device features.Molecular weight: Photosensitive Resist Film with controlled molecular weight distribution is used in nanoimprint lithography, where it delivers uniform film formation and optimal etch resistance.Surface roughness: Photosensitive Resist Film with low surface roughness is used in optical component patterning, where it enables defect-free surfaces for high-performance optical devices.
Free Quote
Competitive Photosensitive Resist Film prices that fit your budget—flexible terms and customized quotes for every order.
For samples, pricing, or more information, please contact us at
+8615651039172
or mail to
sales9@bouling-chem.com.
We will respond to you as soon as possible.
Tel: +8615651039172
Email: sales9@bouling-chem.com
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Certification & Compliance
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Photosensitive Resist Film is manufactured under an ISO 9001 quality system and complies with relevant regulatory requirements.
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COA, SDS/MSDS, and related certificates are available upon request.
For certificate requests or inquiries, contact: sales9@bouling-chem.com.
