Aluminum Oxide

Purity 99.9%: Aluminum Oxide with 99.9% purity is used in semiconductor wafer polishing, where it ensures minimal contamination and high surface finish quality. Particle size 10 µm: Aluminum Oxide with a 10 µm particle size is used in abrasive blasting, where it provides uniform material removal and surface etching. Melting point 2072°C: Aluminum Oxide with a melting point of 2072°C is used in refractory brick production, where it imparts high thermal stability and prolonged lifespan. Nano grade: Aluminum Oxide in nano grade form is used in advanced ceramics manufacturing, where it enhances mechanical strength and thermal conductivity. High hardness: Aluminum Oxide with high hardness is used in cutting tool coatings, where it increases wear resistance and operational durability. Porosity 20%: Aluminum Oxide with 20% porosity is used in filtration membranes, where it offers efficient particulate retention and fluid permeability. Specific surface area 120 m²/g: Aluminum Oxide with a specific surface area of 120 m²/g is used in catalyst supports, where it maximizes active site dispersion and catalytic efficiency. Stability temperature 1500°C: Aluminum Oxide stable up to 1500°C is used in kiln furniture, where it withstands repeated heating cycles without structural degradation. Electrical resistivity 10¹⁴ Ω·cm: Aluminum Oxide with electrical resistivity of 10¹⁴ Ω·cm is used in electronic substrates, where it provides excellent electrical insulation and minimal leakage current. Density 3.95 g/cm³: Aluminum Oxide with a density of 3.95 g/cm³ is used in ceramic ball bearings, where it offers high load-bearing capacity and dimensional precision.